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Title:
PHOTOCURABLE COMPOSITION, AND PATTERN FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2017141456
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable composition with small release force and also provide an optical imprint method with small release force.SOLUTION: A photocurable composition at least has a polymerizable monomer (A), a polymerization initiator (B), and a fluorine atom-containing surfactant (C), with a contact angle of water to a photocured product of the composition being 74° or less.SELECTED DRAWING: Figure 1

Inventors:
ITO TOSHIKI
MIHARA CHIEKO
KAWASAKI YOJI
OKINAKA MOTOKI
KAWABATA KANAE
Application Number:
JP2017051542A
Publication Date:
August 17, 2017
Filing Date:
March 16, 2017
Export Citation:
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Assignee:
CANON KK
International Classes:
C08F2/48; B29C59/02; H05K3/28
Domestic Patent References:
JP2013122044A2013-06-20
JP2010206189A2010-09-16
JP2001106710A2001-04-17
JP2010017936A2010-01-28
JP2007084625A2007-04-05
JPH093358A1997-01-07
Foreign References:
WO2010064609A12010-06-10
WO2007010918A12007-01-25
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa



 
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