Title:
ＥＵＶリソグラフィ用光学部材
Document Type and Number:
Japanese Patent JP5590044
Kind Code:
B2
Abstract:
There are provided an EUV optical member, in which deterioration in the reflectivity due to oxidation of the Ru protective layer is prevented, a functional film-equipped substrate to be employed for production of the EUV optical member. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer has a three-layer structure wherein a first layer made of a Ru layer or a Ru compound layer, a second layer made of a Mo layer and a third layer made of a Ru layer or a Ru compound layer are laminated in this order on the reflective layer.
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Inventors:
Masaki Mikami
Application Number:
JP2011545229A
Publication Date:
September 17, 2014
Filing Date:
December 08, 2010
Export Citation:
Assignee:
Asahi Glass Co., Ltd.
International Classes:
H01L21/027; G03F1/24; G03F1/48; G03F7/20
Domestic Patent References:
| JP2005516182A | 2005-06-02 | |||
| JP2001523007A | 2001-11-20 | |||
| JP2006170916A | 2006-06-29 |
Foreign References:
| WO2008090988A1 | 2008-07-31 |
Attorney, Agent or Firm:
Mochitoshi Watanabe
Haruko Miwa
Yoichi Takemoto
Haruko Miwa
Yoichi Takemoto