Title:
光学システム及び露光装置
Document Type and Number:
Japanese Patent JP5882286
Kind Code:
B2
Abstract:
The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
Inventors:
Beak hermann
Ville marx
Bischoff Thomas
Kwan Im-Bun Patrick
Nguyen You-Reem
Ksarter Stefan
Mule Bayer Michael
Ville marx
Bischoff Thomas
Kwan Im-Bun Patrick
Nguyen You-Reem
Ksarter Stefan
Mule Bayer Michael
Application Number:
JP2013231362A
Publication Date:
March 09, 2016
Filing Date:
November 07, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/00; G02B13/14; G03B9/04
Domestic Patent References:
| JP2000173916A | ||||
| JP2002118053A | ||||
| JP2002372735A | ||||
| JP2002509653A |
Attorney, Agent or Firm:
Kenji Sugimura
Groundwork Kenichi
Groundwork Kenichi