Title:
マイクロリソグラフィ投影露光装置のための光学系及びマイクロリソグラフィ露光方法
Document Type and Number:
Japanese Patent JP5892499
Kind Code:
B2
Abstract:
The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement comprises at least one first array of first polarization-influencing elements and a second array of second polarization-influencing elements, wherein the first and second arrays are arranged successively in the light propogation direction, wherein the first and second polarization-influencing elements in each case have a birefringence that is dependent on the presence of an electric field, and wherein the first polarization-influencing elements and the second polarization-influencing elements are transverse Pockels cells.
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Inventors:
Zenger Ingo
Schlezener Frank
Schlezener Frank
Application Number:
JP2014551547A
Publication Date:
March 23, 2016
Filing Date:
December 11, 2012
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G02B19/00; G03F7/20
Domestic Patent References:
| JP2009272624A | ||||
| JP2006060546A | ||||
| JP2007180088A | ||||
| JP2007515768A |
Foreign References:
| WO2011154227A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
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