Title:
Optical system of microlithography projection exposure equipment
Document Type and Number:
Japanese Patent JP6359521
Kind Code:
B2
Abstract:
The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a second reflection surface, wherein the first reflection surface and the second reflection surface are arranged at an angle of 0°±10° or at an angle of 90°±10° relative to one another, wherein light incident on the first reflection surface during the operation of the optical system forms an angle of 45°±5° with the first reflection surface, and wherein the polarization-influencing arrangement is rotatable about a rotation axis running parallel to the light propagation direction of light incident on the first reflection surface during the operation of the optical system.
Inventors:
Zenger Ingo
Schlezener Frank
Schlezener Frank
Application Number:
JP2015506163A
Publication Date:
July 18, 2018
Filing Date:
March 26, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B17/00; G02B19/00
Domestic Patent References:
JP2003133212A | ||||
JP2005303084A | ||||
JP2001203136A | ||||
JP4225357A | ||||
JP2008538452A | ||||
JP2000098231A |
Foreign References:
US20030081210 | ||||
WO2006082738A1 | ||||
US20070132977 | ||||
EP0486316A2 | ||||
US6137618 | ||||
US20080192225 |
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu