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Patent Searching and Data


Title:
Optical system of microlithography projection exposure equipment
Document Type and Number:
Japanese Patent JP6359521
Kind Code:
B2
Abstract:
The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a second reflection surface, wherein the first reflection surface and the second reflection surface are arranged at an angle of 0°±10° or at an angle of 90°±10° relative to one another, wherein light incident on the first reflection surface during the operation of the optical system forms an angle of 45°±5° with the first reflection surface, and wherein the polarization-influencing arrangement is rotatable about a rotation axis running parallel to the light propagation direction of light incident on the first reflection surface during the operation of the optical system.

Inventors:
Zenger Ingo
Schlezener Frank
Application Number:
JP2015506163A
Publication Date:
July 18, 2018
Filing Date:
March 26, 2013
Export Citation:
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Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B17/00; G02B19/00
Domestic Patent References:
JP2003133212A
JP2005303084A
JP2001203136A
JP4225357A
JP2008538452A
JP2000098231A
Foreign References:
US20030081210
WO2006082738A1
US20070132977
EP0486316A2
US6137618
US20080192225
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu