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Title:
金属銅堆積用の前駆体物質としてのシュウ酸二銅(I)錯体
Document Type and Number:
Japanese Patent JP4477490
Kind Code:
B2
Abstract:
The invention relates to dicopper(I) oxalate complexes stabilised by neutral Lewis base components and to the use thereof as precursors for the deposition of metallic copper. The neutral Lewis bases used are alkynes or alkenes containing at least one silyl or ester group, or nitrites, saturated or unsaturated nitrogen ligands, phosphites, trialkyl-phosphines or oxygen- or sulfur-containing ligands.

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Inventors:
Koehler, Katrin
Mayer, Frank
Application Number:
JP2004514666A
Publication Date:
June 09, 2010
Filing Date:
June 05, 2003
Export Citation:
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Assignee:
BASF Aktiengesellschaft
International Classes:
C07C55/07; C07C51/41; C07F1/08; C07F7/08; C23C16/18; H05K3/10
Foreign References:
WO2000015866A1
WO2000063461A1
US4387055
Attorney, Agent or Firm:
Akio Miyazaki
Ishibashi Masayuki
Masaaki Ogata