Title:
A pattern formation method, admiration active light nature or a radiation-sensitive resin composition, a resist film, a manufacturing method of an electronic devide using these
Document Type and Number:
Japanese Patent JP6209344
Kind Code:
B2
Abstract:
There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (P).
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| WO/2018/131669 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD |
| JP4389582 | Photosensitive resin composition |
Inventors:
Yokogawa Natsumi
Hirano Osamu
Wataru Futashi
Hiroo Takizawa
Hirano Osamu
Wataru Futashi
Hiroo Takizawa
Application Number:
JP2013054398A
Publication Date:
October 04, 2017
Filing Date:
March 15, 2013
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/038; C08F20/26; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2011170316A | ||||
| JP2010126667A | ||||
| JP200831160A | ||||
| JP200833287A | ||||
| JP2012246426A | ||||
| JP2012233968A | ||||
| JP2013178515A | ||||
| JP201357836A | ||||
| JP200833287A | ||||
| JP2010126667A | ||||
| JP200831160A | ||||
| JP2012246426A | ||||
| JP2013250433A |
Foreign References:
| WO2012121278A1 |
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office
Takeshi Takamatsu
Toshiyuki Ozawa
Takeshi Takamatsu
Toshiyuki Ozawa
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