Title:
新規なスルホニウム化合物、該化合物を含有する感光性組成物及び該感光性組成物を用いたパターン形成方法
Document Type and Number:
Japanese Patent JP4792299
Kind Code:
B2
Abstract:
A photosensitive composition, which comprises a compound represented by formula (I):
wherein R 1 to R 13 each independently represents a hydrogen atom or a substituent, and at least one of R 1 to R 13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X- represents a counter anion; and a pattern-forming method using the photosensitive composition.
More Like This:
Inventors:
Kawanishi Andai
Application Number:
JP2006029870A
Publication Date:
October 12, 2011
Filing Date:
February 07, 2006
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C07D327/08; C07D333/76; C07D339/08; H01L21/027
Domestic Patent References:
| JP2005501040A | ||||
| JP2005263897A | ||||
| JP2003121999A | ||||
| JP2002148788A | ||||
| JP6199770A | ||||
| JP2006328297A | ||||
| JP2007094356A | ||||
| JP2005115016A |
Foreign References:
| US20050064333 | ||||
| US20040265733 |
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa
Kiyozumi Yazawa