Title:
スピンオン・セラミック膜からなるパターニング層
Document Type and Number:
Japanese Patent JP2006517742
Kind Code:
A
Abstract:
The present invention comprises a method for forming a hardmask including the steps of depositing a polymeric preceramic precursor film atop a substrate; converting the polymeric preceramic precursor film into at least one ceramic layer, where the ceramic layer has a composition of SivNwCxOyHz where 0.1<=v<=0.9, 0<=w<=0.5, 0.05<=x<=0.9, 0<=y<=0.5, 0.05<=z<=0.8 for v+w+x+y+z=1; forming a patterned photoresist atop the ceramic layer; patterning the ceramic layer to expose regions of the underlying substrate, where a remaining region of the underlying substrate is protected by the patterned ceramic layer; and etching the exposed region of the underlying substrate. Another aspect of the present invention is a buried etch stop layer having a composition of SivNwCxOyHz where 0.05
Inventors:
Gates, Stephan, M
Hedrick, Jeffrey, Sea
Han, Elbert, Yi
Fifa, dark
Hedrick, Jeffrey, Sea
Han, Elbert, Yi
Fifa, dark
Application Number:
JP2006503032A
Publication Date:
July 27, 2006
Filing Date:
January 26, 2004
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
H01L21/768; G03G13/06; H01L21/00; H01L21/311; H01L21/312; H01L21/316; H01L21/3205; H01L21/44; H01L23/48; H01L23/522; H05B6/64; H01L
Domestic Patent References:
| JP2002012761A | 2002-01-15 |
Foreign References:
| WO2000054329A1 | 2000-09-14 | |||
| WO2002093641A1 | 2002-11-21 |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Takeshi Ueno
Yoshihiro City
Takeshi Ueno