Title:
位相フィルタ、撮像光学系、及び撮像システム
Document Type and Number:
Japanese Patent JP6471031
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a phase filter capable of achieving a focal-depth enlarged image while preventing positional displacement on a reproduced image as well as suppressing increase of noises superior in uniformity of spot distribution in a focus direction.SOLUTION: A phase filter (101) having the optical axis, which is formed of a transparent material. The surface of the phase filter is constituted of n (n is a natural number greater than 2) inclined planes (20), which are continuously formed around an optical axis (10), and steps (30) formed at the boundary of the neighboring inclined planes. The phase filter is arranged to deflect-refract a flux of light entering parallel to the optical axis in a circumferential direction via a curved surface with respect to the optical axis.SELECTED DRAWING: Figure 1
Inventors:
Ken Shimano
Mitsuhiko Ota
Koichi Sakita
Mitsuhiko Ota
Koichi Sakita
Application Number:
JP2015083500A
Publication Date:
February 13, 2019
Filing Date:
April 15, 2015
Export Citation:
Assignee:
Maxell Co., Ltd.
International Classes:
G02B5/00; G03B11/00; H04N5/225; H04N5/232
Domestic Patent References:
| JP7325269A | ||||
| JP2010085487A | ||||
| JP2011150635A | ||||
| JP2011518341A | ||||
| JP7325258A | ||||
| JP2014197115A | ||||
| JP2009088829A | ||||
| JP2007323480A |
Foreign References:
| US20090122180 | ||||
| WO2015015944A1 |
Other References:
Jiangfei Hu et al.,Comparative study of wavefront coding imaging with rotational and non-rotational symmetric phase masks,PROCEEDINGS OF SPIE,2013年,8911,89110Z-1 - 89110Z-10
Attorney, Agent or Firm:
Patent Business Corporation Takewa International Patent Office