A photoelectric conversion device, its manufacturing method, and a manufacturing method of an imaging device using the photoelectric conversion device concerned

Japanese Patent JP6164334

B2

PROBLEM TO BE SOLVED: To solve the following problem: In shifting a line defect of an array substrate to a point defect by a repair using laser or the like, some damage is sometimes done to PD or TFT by damage due to laser energy during a repair and even when a damaged element has a normal initial operation, its characteristics may change in the course of long-term operation and thus a point defect may generate in use because of difficult correction.SOLUTION: Electrical connection of a switching element of a pixel at a position at which a line defect has been repaired with a photo diode or data wiring is isolated and registered as a defect pixel not subjected to previous charging before image processing.SELECTED DRAWING: Figure 1

WO/2004/093196	SOLID-STATE IMAGER AND METHOD FOR MANUFACTURING SAME
JP6116344	Solid imaging device
JP2023167634	IMAGING ELEMENT AND IMAGING APPARATUS

Kenichi Miyamoto
Masami Hayashi
Hideki Noguchi
Yusuke Murakami

JP2016085010A

July 19, 2017

April 21, 2016

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Mitsubishi Electric Corporation

H01L27/146; A61B6/00; G01T7/00; H01L21/3205; H01L21/768; H01L21/82; H01L23/522; H01L27/144; H01L31/10; H04N5/32; H04N5/367; H04N5/374

JP2010225735A
JP2001135809A
JP2009124079A
JP2007201365A
JP2000292810A
JP2004279639A

WO2006025085A1

Tadahiko Inaba
Kanako Murakami
Shigeaki Matsui
Kuratani Yasutaka

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