Title:
A photograph spacer using a photosensitive resin composition and the photosensitive resin composition
Document Type and Number:
Japanese Patent JP6184094
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition from which a desired columnar molded body can be formed, and more particularly, a photospacer in a non-reverse tapered shape can be formed.SOLUTION: The photosensitive resin composition comprises an alkali-soluble resin, a polyfunctional monomer, a first photopolymerization initiator having a maximum absorption wavelength at a wavelength from 290 nm to 380 nm, and a second photopolymerization initiator having a maximum absorption wavelength at a wavelength from 230 nm to 290 nm. In a preferred embodiment, the first photopolymerization initiator is an α-aminoketone compound. In a preferred embodiment, the second photopolymerization initiator is an α-hydroxyketone compound.
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Inventors:
Shinsuke Tanaka
Koji Kahara
Koji Kahara
Application Number:
JP2012284668A
Publication Date:
August 23, 2017
Filing Date:
December 27, 2012
Export Citation:
Assignee:
Nippon Shokubai Co., Ltd.
International Classes:
G03F7/031; C08F290/12; G02F1/1339; G03F7/004; G03F7/038
Domestic Patent References:
| JP2011043806A | ||||
| JP2007171767A | ||||
| JP2008107538A | ||||
| JP2012173647A | ||||
| JP2012063739A | ||||
| JP2008075011A |
Attorney, Agent or Firm:
Katsuto Momii