Title:
フォトマスクブランク及びフォトマスクの製造方法
Document Type and Number:
Japanese Patent JP4650608
Kind Code:
B2
Abstract:
A photomask blank is prepared by forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40 J/cm2. A photomask is prepared by forming a resist pattern on the photomask blank by photolithography, etching away those portions of the light-absorbing film which are not covered with the resist pattern, and removing the resist.
Inventors:
Fukushima Shinyasu
Hiroki Yoshikawa
Hero Kaneko
Hiroki Yoshikawa
Hero Kaneko
Application Number:
JP2004147403A
Publication Date:
March 16, 2011
Filing Date:
May 18, 2004
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C23C14/00; C23C14/06; C25B9/00; C25B11/00; C25B13/00; G03C5/00; G03F1/32; G03F1/54; G03F1/68; G03F9/00; H01L21/027
Domestic Patent References:
| JP2002162727A | ||||
| JP2003197555A | ||||
| JP2002062632A | ||||
| JP2004199035A | ||||
| JP2003280168A | ||||
| JP61173252A | ||||
| JP8220731A | ||||
| JP2004226593A | ||||
| JP7140635A | ||||
| JP2002229183A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa