Title:
フォトマスクおよびプロトタイプ仕様を用いたその資格づけ方法
Document Type and Number:
Japanese Patent JP2005517203
Kind Code:
A
Abstract:
A photomask and method for qualifying the same with a prototype specification are disclosed. The method includes comparing a plurality of die sites formed in a patterned layer on a photomask with a prototype specification. If at least one of the die sites complies with the prototype specification, the photomask is selected for used in a semiconductor manufacturing process.
Inventors:
Kakujin, Craig, Doubleview
Application Number:
JP2003551610A
Publication Date:
June 09, 2005
Filing Date:
December 10, 2002
Export Citation:
Assignee:
DuPont, Futa Masks, Ink
International Classes:
G03F1/00; G03F1/84; G03F7/20; G06F17/50; G06F19/00; G06K9/00; H01L21/027; G03F; (IPC1-7): G03F1/08; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Yuzo Sanada
Nobuhiko Nakajima
Ohara Shizuo
Nobuhiko Nakajima
Ohara Shizuo