Title:
新規の樹脂およびこれを含むフォトレジスト組成物
Document Type and Number:
Japanese Patent JP5735220
Kind Code:
B2
Abstract:
Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring, aromatic and/or multi-cyclic ester monomers.
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Inventors:
Kon Ryu
Chen-By Sue
Chen-By Sue
Application Number:
JP2010115708A
Publication Date:
June 17, 2015
Filing Date:
May 19, 2010
Export Citation:
Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
G03F7/039; C08F20/10; C08F32/04
Domestic Patent References:
| JP2002003537A | ||||
| JP2005097533A | ||||
| JP2008083385A |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office