Title:
フォトレジスト用重合性化合物、その重合体及び該重合体を含むフォトレジスト組成物
Document Type and Number:
Japanese Patent JP5193597
Kind Code:
B2
Abstract:
The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.
Inventors:
Naoyoshi Hatakeyama
Katsuki Ito
Ohno Hidetoshi
Nobuaki Matsumoto
Katsuki Ito
Ohno Hidetoshi
Nobuaki Matsumoto
Application Number:
JP2007516274A
Publication Date:
May 08, 2013
Filing Date:
May 15, 2006
Export Citation:
Assignee:
IDEMITSU KOSAN CO.,LTD.
International Classes:
C07C69/54; C07D307/33; C07D307/93; C08F20/10; C08F32/00; C08F38/00; G03F7/039
Domestic Patent References:
| JP2001131138A | 2001-05-15 | |||
| JP2005326609A | 2005-11-24 | |||
| JP2006089412A | 2006-04-06 | |||
| JP2006113140A | 2006-04-27 | |||
| JP2001215708A | 2001-08-10 | |||
| JP2001131138A | 2001-05-15 | |||
| JP2005326609A | 2005-11-24 | |||
| JP2006089412A | 2006-04-06 | |||
| JP2006113140A | 2006-04-27 |
Attorney, Agent or Firm:
Tamotsu Otani
Masamichi Tohei
Masamichi Tohei