Title:
感光性エレメント、積層体、永久マスクレジスト及びその製造方法並びに半導体パッケージの製造方法
Document Type and Number:
Japanese Patent JP6683125
Kind Code:
B2
Abstract:
Provided is a photosensitive element including a support film, and a photosensitive layer provided on the support film and formed from a photosensitive resin composition, in which the surface roughness of the surface of the support film that is in contact with the photosensitive layer is 200 to 4,000 nm.
Inventors:
Toshimasa Nagoshi
Keio Tanaka
Fukuzumi Shizu
Keio Tanaka
Fukuzumi Shizu
Application Number:
JP2016515225A
Publication Date:
April 15, 2020
Filing Date:
April 24, 2015
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
G03F7/09; B32B27/00; B32B27/38; G03F7/004; G03F7/027; G03F7/029; G03F7/20; H05K3/28
Domestic Patent References:
| JP2007178500A | ||||
| JP2007041493A | ||||
| JP2002185132A | ||||
| JP2006220886A | ||||
| JP2012027368A | ||||
| JP2010085513A |
Foreign References:
| WO2006059534A1 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu
Hiroyuki Hirano
Yoshinori Shimizu
Hiroyuki Hirano