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Title:
シリコンを含むアルキルビニルエーテルの重合体よりなる感光性ポリマー及びこれを含むレジスト組成物
Document Type and Number:
Japanese Patent JP4137489
Kind Code:
B2
Abstract:
A photosensitive polymer of a resist composition includes a copolymer of alkyl vinyl ether containing silicon and maleic anhydride, represented by the following formula:where R1 is -H, -OSi(CH3)2C(CH3)3 or -OSi(CH3)3; R2 is -H, -OH, -OCOCH3, -OSi(CH3)2C(CH3)3 or -OSi(CH(CH3)2)3; R3 is -H, -OH or -OCOCH3; R4 is -H, -OSi(CH3)2C(CH3)3, -CH2OSi(CH3)2C(CH3)3 or -CH2OSi(CH(CH3)2)3; and at least one of R1, R2, R3 and R4 is a Si-containing group.

Inventors:
Kim wise friend
Common sense
Ginger law
Application Number:
JP2002102697A
Publication Date:
August 20, 2008
Filing Date:
April 04, 2002
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
C08F34/02; C08F222/06; G03F7/039; G03F7/033; G03F7/075; G03F7/004
Domestic Patent References:
JP6194842A
JP5165219A
JP2002105086A
JP2000199970A
Other References:
Journal of Photopolymer Science and Technology,1999年,Volume 12, Number 4,561-570
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani



 
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