Title:
A plasma CVD device and a manufacturing method of a sheet material
Document Type and Number:
Japanese Patent JP6003659
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a plasma CVD device and a manufacturing method of a sheet material that prevent impedance change caused by deposits stuck to an electrode and stably deposit a vapor deposit material on a substrate over a long period.SOLUTION: A plasma CVD device 10 includes a vacuum chamber 11, a substrate supplying part 12 disposed in the vacuum chamber 11 for supplying a substrate 51, and a substrate winding part 13 disposed in the vacuum chamber 11 for winding the substrate 51. A pair of plasma guns 20, 20 that generates plasma P and applies voltage between them is disposed in the vacuum chamber 11. A pair of the guns 20, 20 is connected to a high frequency power source 21. A process gas supply unit 30 is installed to supply a process gas for forming a plasma deposition layer 52, into the vacuum chamber 11.
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Inventors:
Appearance Tatsuhiko
Application Number:
JP2013001965A
Publication Date:
October 05, 2016
Filing Date:
January 09, 2013
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C16/513; B01J35/02; B01J37/02; H05H1/46
Domestic Patent References:
| JP9027123A | ||||
| JP2004018998A | ||||
| JP2000235930A | ||||
| JP2001517269A | ||||
| JP2009052103A | ||||
| JP2013001926A | ||||
| JP2003096571A | ||||
| JP2008211243A | ||||
| JP2006318762A |
Attorney, Agent or Firm:
Hirohito Katsunuma
Hiroyuki Nagai
Katsuomi Isogai
Yukihiro Hotta
Takuhisa Murata
Hiroyuki Nagai
Katsuomi Isogai
Yukihiro Hotta
Takuhisa Murata