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Title:
調節可能であるルーバー加工されたプラズマエレクトロンフラッド筐体
Document Type and Number:
Japanese Patent JP5519789
Kind Code:
B2
Abstract:
An apparatus is provided for reducing particle contamination in an ion implantation system. The apparatus has an enclosure having an entrance, an exit, and at least one louvered side having a plurality of louvers defined therein. A beamline of the ion implantation system passes through the entrance and exit, wherein the plurality of louvers of the at least one louvered side are configured to mechanically filter an edge of an ion beam traveling along the beamline. The enclosure can have two louvered sides and a louvered top, wherein respective widths of the entrance and exit of the enclosure, when measured perpendicular to the beamline, are generally defined by a position of the two louvered sides with respect to one another. One or more of the louvered sides can be adjustably mounted, wherein the width of one or more of the entrance and exit of the enclosure is controllable.

Inventors:
Corbin, Neil
Application Number:
JP2012520625A
Publication Date:
June 11, 2014
Filing Date:
July 15, 2010
Export Citation:
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Assignee:
AXCELIS TECHNOLOGIES, INC.
International Classes:
H01J37/317; H01J3/40; H01J37/02; H01L21/265
Domestic Patent References:
JP9190794A
JP2004508668A
JP200834384A
JP2304850A
JP20064925A
JP1153360U
JP201013709A
Foreign References:
WO2008038700A1
Attorney, Agent or Firm:
Harakenzo world patent & trademark