Title:
プラズマ処理方法，半導体基板及びプラズマ処理装置
Document Type and Number:
Japanese Patent JPWO2004070816
Kind Code:
A
Inventors:
Junichi Kitagawa
Application Number:
JP2004001180W
Publication Date:
August 19, 2004
Filing Date:
February 05, 2004
Export Citation:
Assignee:
Tokyo Electron, Ltd.
International Classes:
H01L29/792; H01L21/8247; H01L21/318; H01L29/788; H01L27/115
Attorney, Agent or Firm:
Yoshiaki Kameya
Yasushi Hagiwara
Tetsuo Kanamoto
Yasushi Hagiwara
Tetsuo Kanamoto
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