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Title:
A plasma treatment apparatus and a filter unit
Document Type and Number:
Japanese Patent JP6027374
Kind Code:
B2
Abstract:
Provided is a plasma processing apparatus in which an external circuit is electrically connected, via a line, to a predetermined electric member within a processing container thereof, and noises of first and second high frequency waves are attenuated or blocked by a filter provided on the line when the noises enter the line from the electric member toward the external circuit. The filter includes: an air core coil provided at a first stage when viewed from the electric member side; a toroidal coil connected in series with the air core coil; an electroconductive casing configured to accommodate or enclose the air core coil and the toroidal coil; a first condenser electrically connected between a connection point between the air core coil and the toroidal coil and the casing; and a second condenser connected between a terminal of the toroidal coil at the external circuit side and the casing.

Inventors:
Eki Ito
Maki Nishikawa
Naohiko Okunishi
Junichi Shimada
Ken Koyanagi
Application Number:
JP2012200740A
Publication Date:
November 16, 2016
Filing Date:
September 12, 2012
Export Citation:
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Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; H01L21/3065; H03H7/01
Domestic Patent References:
JP2011135052A
JP2009123505A
JP2129373A
JP2009164608A
JP2008034812A
JP2012089924A
JP2006100465A
JP2006238310A
Attorney, Agent or Firm:
Seishin ip patent business corporation
Filial piety Sasaki