Title:
Plasma processing equipment and top electrode assembly
Document Type and Number:
Japanese Patent JP6298373
Kind Code:
B2
Abstract:
A plasma processing apparatus includes supporting members, connecting members, a rotation member and fixing members. Each of the supporting members is partially disposed in a disc-shaped cooling plate and configured to support an upper electrode provided below the cooling plate. Each of the connecting members is partially disposed in the cooling plate and extends in a diametrical direction of the cooling plate to be engaged with the corresponding supporting member. The rotation member is provided to surround an outer periphery of the cooling plate and has recesses formed to face the cooling plate and engaged with the corresponding connecting members. Each of the fixing members is configured to lift and fix the upper electrode to the cooling plate by applying a torque to the corresponding connecting member.
Inventors:
Shin Matsuura
Chung Shun swimming
Keita Kamihara
Chung Shun swimming
Keita Kamihara
Application Number:
JP2014143292A
Publication Date:
March 20, 2018
Filing Date:
July 11, 2014
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; H01L21/3065
Domestic Patent References:
| JP2010251752A | ||||
| JP2010517266A | ||||
| JP2006032821A |
Foreign References:
| WO2001088971A1 | ||||
| US20100261354 |
Attorney, Agent or Firm:
Hiroaki Sakai
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