Title:
偏光評価マスク、偏光評価方法、及び偏光計測装置
Document Type and Number:
Japanese Patent JP4928897
Kind Code:
B2
Abstract:
A polarization evaluation mask for evaluating the state of polarization of an illumination light in exposure equipment comprises a transparent substrate; a light interceptor formed in said transparent substrate and having a plurality of fine apertures; a plurality of polarizers formed to cover said plurality of fine apertures and having orientation angles of the transmissive polarization differing in increments of certain angle; and a plurality of quarter-wave plates arranged upstream of said illumination light than said polarizers and formed as superimposed on said polarizers to cover said fine apertures, and having orientation angles of the fast axis differing in increments of certain angle. Each of said plurality of fine apertures has a different combination of said orientation angle of said polarizer and said orientation angle of said quarter-wave plate.
Inventors:
Hiroshi Nomura
Application Number:
JP2006283812A
Publication Date:
May 09, 2012
Filing Date:
October 18, 2006
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F1/44; G01J4/04; H01L21/027
Domestic Patent References:
| JP2004047737A |
Foreign References:
| WO2006078843A1 |
Attorney, Agent or Firm:
Masaru Itami
Kazuhiko Tamura
Kazuhiko Tamura