A polishing pad which has the polish surface accompanied by a continuation projection part which has a tapered shape side wall

Title:

A polishing pad which has the polish surface accompanied by a continuation projection part which has a tapered shape side wall

Document Type and Number:

Japanese Patent JP6085064

Kind Code:

B2

Abstract:

Polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are also described.

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Inventors:

Lefebvre, Paul Andre
Allison, William Sea.
Simpson, Alexander William
Scott, Diane
Juan, Pin
Charnes, Leslie M.
Line heart, james richard
Cape Rich, Robert

Application Number:

JP2016500664A

Publication Date:

February 22, 2017

Filing Date:

March 05, 2014

Export Citation:

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Assignee:

Nexplanar corporation

International Classes:

B24B37/26; B24B37/24; H01L21/304

Domestic Patent References:

JP2002057130A
JP2000158327A
JP2005183707A
JP2001079755A
JP2000301450A

Foreign References:

US20030114084

Attorney, Agent or Firm:

Hidesaku Yamamoto
Natsuki Morishita
Takatoshi Iida
Daisuke Ishikawa
Kensaku Yamamoto

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