A pollution valuation method of an epitaxial silicon wafer, and a pollution valuation method in an epitaxial growth system furnace

Title:

A pollution valuation method of an epitaxial silicon wafer, and a pollution valuation method in an epitaxial growth system furnace

Document Type and Number:

Japanese Patent JP6070095

Kind Code:

B2

Inventors:

Shun Sasaki
Takeshi Kadono
Kazunari Kurita

Application Number:

JP2012249659A

Publication Date:

February 01, 2017

Filing Date:

November 13, 2012

Export Citation:

Assignee:

Sumco inc.

International Classes:

H01L21/66; H01L21/20; H01L21/205; H01L21/322

Domestic Patent References:

JP11074276A
JP2011253983A

Foreign References:

WO2009133720A1
WO2008149806A1

Attorney, Agent or Firm:

Kenji Sugimura
Keisuke Kawahara

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