Title:
ポリマー混合物ならびに関連する調製法および使用法
Document Type and Number:
Japanese Patent JP4036773
Kind Code:
B2
Abstract:
A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.
Inventors:
Gregory Bleta
Hiroshi Ito
Hoa De Truong
Hiroshi Ito
Hoa De Truong
Application Number:
JP2003049993A
Publication Date:
January 23, 2008
Filing Date:
February 26, 2003
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
C08L45/00; G03F7/027; C08F212/14; C08F216/14; C08F232/08; C08L33/16; C08L101/00; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Foreign References:
| WO2000067072A1 |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Takeshi Ueno
Yoshihiro City
Takeshi Ueno