Title:
重合体、重合体製造方法、フォトレジスト、フォトレジスト製造方法および半導体素子
Document Type and Number:
Japanese Patent JP4183815
Kind Code:
B2
Abstract:
The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (-OH).
Inventors:
Chung Min Ho
Chung Zhao Chang
Choru Kei
White base ho
Chung Zhao Chang
Choru Kei
White base ho
Application Number:
JP36751898A
Publication Date:
November 19, 2008
Filing Date:
December 24, 1998
Export Citation:
Assignee:
HYNIX SEMICONDUCTOR INC.
International Classes:
C08F222/06; C07C67/347; C07C69/753; C08F4/04; C08F22/06; C08F32/00; C08F232/06; C08F232/08; G03F7/004; G03F7/027; G03F7/039; H01L21/027
Domestic Patent References:
| JP5310885A | ||||
| JP9073173A |
Foreign References:
| WO1997033198A1 |
Other References:
JOURNAL OF THE AMERICAN MOSQUITO CONTROL ASSOCIATION,1988年,vol.4, no.3,p.314-321
Journal of Photopolymer Science and Technology,1997年 7月 1日,vol.10, no.4,p.529-533
Journal of Photopolymer Science and Technology,1997年 7月 1日,vol.10, no.4,p.529-533
Attorney, Agent or Firm:
Hiroshi Arafune
Yoshio Arafune
Yoshio Arafune
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