Title:
アセタールで保護されたポリマーおよびそのフォトレジスト組成物
Document Type and Number:
Japanese Patent JP2005527673
Kind Code:
A
Abstract:
A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III:wherein R<1>, R<4>, R<5 >and R<6 >are each independently H, lower alkyl, CH2CO2R<10>, cyano, CH2CN, or halogen, wherein R<10 >is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R<2 >is CHR<11>R<12 >where R<11 >and R<12 >are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R<3 >is linear, branched or cyclic fluoroalkyl group or SiR<13>R<14>R<15 >where R<13>, R<14>, and R<15 >are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(=O)-O-(CH2)x where x=0-4, lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cyclic polysiloxane group. R<7 >is H or an acid sensitive group; R<8 >and R<9 >are each independently H or -CN group; and y=0-4 and the use of these polymers in radiation sensitive compositions for exposure to actinic radiation, especially radiation of 157 nm.
Inventors:
Sanjay Malik
Stephanie jay dirocker
Binod B De
Stephanie jay dirocker
Binod B De
Application Number:
JP2004507440A
Publication Date:
September 15, 2005
Filing Date:
May 28, 2003
Export Citation:
Assignee:
OLIN MICROELECTRONIC CHEMICALS,INC.
International Classes:
C08F2/54; C08F8/00; C08F212/14; C08F232/08; C08K3/00; G03F7/004; G03F7/039; G03F7/075; H01L21/027; (IPC1-7): C08F212/14; C08F232/08; G03F7/039; G03F7/075; H01L21/027
Attorney, Agent or Firm:
Chika Takagi
Junji Yuda
Shoji Miwa
Junji Yuda
Shoji Miwa