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Title:
ポジ型レジスト組成物、該ポジ型レジスト組成物を用いたパターン形成方法及び該ポジ型レジスト組成物に用いられる化合物
Document Type and Number:
Japanese Patent JP4966796
Kind Code:
B2
Inventors:
Kenji Wada
Application Number:
JP2007245331A
Publication Date:
July 04, 2012
Filing Date:
September 21, 2007
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; G03F7/039; G03F7/11; G03F7/38; H01L21/027
Domestic Patent References:
JP2001022069A
JP8248561A
JP9034106A
JP2000227659A
JP11158118A
Other References:
ARIMITSU, Koji et al.,Autocatalytic Fragmentation ofAcetoacetate Derivatives as Acid Amplifiers to Proliferate AcidMolecules,Journal of the American Chemical Society,米国,1998,120(1),p.37-45
FUKUCHI, Isao et al.,Catalytic asymmetric aldol reactions ofenolizable carbon pronucleophiles with formaldehyde and ethylglyoxylate,Advanced Synthesis & Catalysis,2007年,2007,349(4+5),p.509-512
Barry M. Trost et al.,Asymmetric Alkylation of Allylic gem-Dicarboxylates,Journal of the American Chemical Society,米国,1995 117(27),p7247-7248
Attorney, Agent or Firm:
Takeshi Takamatsu



 
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