Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PROCESSING APPARATUS FOR HYDROGEN-CONTAINING EXHAUST GAS
Document Type and Number:
Japanese Patent JP2017001024
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a processing apparatus for a hydrogen-containing exhaust gas.SOLUTION: A processing apparatus 200 for a hydrogen-containing exhaust gas comprises processing portions 210, 250 where a hydrogen-containing exhaust gas inflow pipe 110 into which a hydrogen-containing exhaust gas HG generated in a semiconductor surface modification process flows and an oxygen-containing air inflow pipe 231 into which oxygen-containing air A flows are connected to at least one side and a plurality of catalyst carrier portions 216, 256 containing a catalyst causing a catalytic reaction with the hydrogen-containing exhaust gas HG are included.SELECTED DRAWING: Figure 2

Inventors:
PARK SANG KWON
Application Number:
JP2016110389A
Publication Date:
January 05, 2017
Filing Date:
June 01, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TERA SEMICON CORP
International Classes:
B01D53/86; B01J35/04; F01N3/20
Attorney, Agent or Firm:
Hatta International Patent Corporation