Title:
投影露光装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP6635167
Kind Code:
B2
Abstract:
A substrate processing device comprises: a projection optical system (PL) which forms an intermediate image by imaging a first projection beam (EL2a) from a mask (M) and forms a projection image by reimaging onto a substrate (P) a second projection beam (EL2b) from an intermediate image surface (P7) on which the intermediate image is formed; and a light intensity reduction unit for reducing the light intensity of leak light generated from the first projection beam (EL2a) and projected onto the substrate (P). The projection optical system (PL) includes a partial optical system (61) for imaging the first projection beam (EL2a) from the mask (M) to project the image onto the intermediate image surface (P7); and a reflection optical system (62) for introducing the first projection beam (EL2a) projected from the partial optical system (61) to the intermediate image surface (P7) while introducing the second projection beam (EL2b) from the intermediate image surface (P7) into the partial optical system (61). The partial optical system (61) reimages the second projection beam (EL2b) from the intermediate image surface (P7) to form the projection image onto the substrate (P).
Inventors:
Masaki Kato
Application Number:
JP2018186122A
Publication Date:
January 22, 2020
Filing Date:
September 28, 2018
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G02B17/08; G02B19/00; G02B27/28
Domestic Patent References:
| JP2009231311A | ||||
| JP2012186508A | ||||
| JP2012185503A |
Attorney, Agent or Firm:
Sakai International Patent Office