Title:
A projection aligner for the micro lithography which has imaging optics and this kind of imaging optics
Document Type and Number:
Japanese Patent JP5946190
Kind Code:
B2
Abstract:
An imaging optical system has a plurality of mirrors which image an object field in an object plane into an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The imaging optical system has precisely eight mirrors. The result is an imaging optical system which exhibits a favorable combination of small imaging errors, manageable production and good throughput.
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Inventors:
Manhans-Jurgen
Eple alexander
Eple alexander
Application Number:
JP2013520978A
Publication Date:
July 05, 2016
Filing Date:
July 30, 2010
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B17/06
Domestic Patent References:
| JP2002139672A | ||||
| JP2005276933A | ||||
| JP2008258461A | ||||
| JP2002162566A |
Foreign References:
| WO2009052925A1 | ||||
| WO2009052962A1 | ||||
| US20080118849 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
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