Title:
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID DIFFUSION CONTROLLING AGENT AND COMPOUND
Document Type and Number:
Japanese Patent JP2017067966
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in LWR performance, resolution, rectangularity of a cross-sectional shape, depth of focus, defect suppressing property and storage stability.SOLUTION: The radiation-sensitive resin composition comprises a polymer having a first structural unit containing an acid-dissociable group, a radiation-sensitive acid generator, and an acid diffusion controlling agent having an anion containing a nitrogen atom and -COOand a radiation-sensitive cation. The -COOin the anion is bonded to a carbon atom; and the carbon atom is further bonded by a double bond to another atom. In the anion of the acid diffusion controlling agent, the carbon atom bonded to the -COOpreferably constitutes an aromatic ring or a carbonyl group. The acid diffusion controlling agent is preferably represented by formula (1) below. In formula (1), Rand Rrepresent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and Lrepresents a divalent organic group having 1 to 40 carbon atoms.SELECTED DRAWING: None
Inventors:
KINOSHITA NATSUKO
Application Number:
JP2015192244A
Publication Date:
April 06, 2017
Filing Date:
September 29, 2015
Export Citation:
Assignee:
JSR CORP
International Classes:
G03F7/004; C08F220/18; C08F220/26; C08F220/38; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013250433A | 2013-12-12 | |||
| JP2007293250A | 2007-11-08 | |||
| JP2006195283A | 2006-07-27 | |||
| JP2016157105A | 2016-09-01 | |||
| JP2016088898A | 2016-05-23 |
Foreign References:
| US20020086234A1 | 2002-07-04 |
Attorney, Agent or Firm:
Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka