Title:
走査型電子顕微鏡装置及び走査型電子顕微鏡装置における装置としての再現性能評価方法
Document Type and Number:
Japanese Patent JP4223979
Kind Code:
B2
Abstract:
The present invention relates to a CDSEM (scanning electron microscope) capable of evaluating and presenting the measurement repeatability as a tool with a high degree of accuracy without being influenced by fluctuations in micro-minute shape that tend to increase with the microminiaturization of semiconductor patterns, and to a method for evaluating accuracy of repeated measurement using the scanning electron microscope. There is provided a function whereby when measuring a plurality of times the same part to be measured, by making use of a micro-minute pattern shape such as the roughness included in the pattern, pattern matching with a roughness template image is performed to correct two-dimensional deviation in position of the part to be measured on an enlarged measurement image acquired, and then an enlarged measurement area image is extracted and acquired. This makes it possible to eliminate variation in measurements caused by the micro-minute pattern shape.
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Inventors:
Ryo Nakagaki
Hiroki Kawada
Chie Shishido
Large Saki Mayuka
Hiroki Kawada
Chie Shishido
Large Saki Mayuka
Application Number:
JP2004073820A
Publication Date:
February 12, 2009
Filing Date:
March 16, 2004
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
G01B15/00; G01N23/00; G01N23/225; G03C5/00; H01J37/28; H01L21/66
Domestic Patent References:
| JP11237231A | ||||
| JP62105006A |
Foreign References:
| WO2003098149A1 |
Attorney, Agent or Firm:
Polaire Patent Business Corporation
Katsuo Ogawa
Kyosuke Tanaka
Katsuo Ogawa
Kyosuke Tanaka