A resin composition for pattern formation, and a pattern formation method

Title:

A resin composition for pattern formation, and a pattern formation method

Document Type and Number:

Japanese Patent JP6058940

Kind Code:

B2

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Inventors:

Tatsuhiro Iwama
Yasuhiro Nakano

Application Number:

JP2012171985A

Publication Date:

January 11, 2017

Filing Date:

August 02, 2012

Export Citation:

Assignee:

ASAHI KASEI KABUSHIKI KAISHA

International Classes:

C08L53/00; H01L21/027; H01L21/312; (IPC1-7): H01L23/473

Domestic Patent References:

Attorney, Agent or Firm:

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Kazuhiro Nakamura
Toko Saito
Shunsuke Mima

Previous Patent: A manufacturing method of a luminescent device and a luminescent device

Next Patent: JPS6058941