Title:
バックボーンにラクトンが含まれた感光性ポリマーよりなるレジスト組成物
Document Type and Number:
Japanese Patent JP3749674
Kind Code:
B2
Abstract:
A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.
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Inventors:
Youn
Chung Higashi
Lee Hajime
Kim wise friend
Lee Shu
Common sense
Cui Ai Shun
Chung Higashi
Lee Hajime
Kim wise friend
Lee Shu
Common sense
Cui Ai Shun
Application Number:
JP2001211147A
Publication Date:
March 01, 2006
Filing Date:
July 11, 2001
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
G03F7/039; C08F220/18; C08F222/06; C08F232/04; C08F234/02; G03F7/004; H01L21/027
Domestic Patent References:
JP11222460A | ||||
JP2001081139A | ||||
JP2002006502A |
Foreign References:
WO1999050322A1 |
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
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