バックボーンにラクトンが含まれた感光性ポリマーよりなるレジスト組成物

Title:

バックボーンにラクトンが含まれた感光性ポリマーよりなるレジスト組成物

Document Type and Number:

Japanese Patent JP3749674

Kind Code:

B2

Abstract:

A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.

More Like This:

JP6438645	A sensitive light-sensitive or radiation-sensitive composition, and a resist film, a pattern forming method, a resist-coated mask blank, a photomask manufacturing method, and an electronic device manufacturing method using the same.
JP4407187	Norbornane-based fluorine-containing compounds
JP6801679	Polymers, positive resist compositions, and resist pattern forming methods

Inventors:

Youn
Chung Higashi
Lee Hajime
Kim wise friend
Lee Shu
Common sense
Cui Ai Shun

Application Number:

JP2001211147A

Publication Date:

March 01, 2006

Filing Date:

July 11, 2001

Export Citation:

Click for automatic bibliography generation Help

Assignee:

Samsung Electronics Co.,Ltd.

International Classes:

G03F7/039; C08F220/18; C08F222/06; C08F232/04; C08F234/02; G03F7/004; H01L21/027

Domestic Patent References:

JP11222460A
JP2001081139A
JP2002006502A

Foreign References:

WO1999050322A1

Attorney, Agent or Firm:

Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani

Previous Patent: FISHING BANK COMPOSED OF SCRAP TIRES

Next Patent: SUPPORT STRUCTURE FOR FOUNDATION OF STRUCTURE