Title:
縮合環の芳香族環を含む保護基を有する感光性ポリマー及びこれを含むレジスト組成物
Document Type and Number:
Japanese Patent JP4056208
Kind Code:
B2
Abstract:
A photosensitive polymer having a protecting group including a fused aromatic ring, and a photoresist composition including the photosensitive polymer are provided. The photosensitive polymer has an acid-labile protecting group at its polymer backbone, the acid-labile protecting group including a fused aromatic ring having formula: where R1 is hydrogen atom or alkyl group having from 1 to 4 carbon atoms; X is hydrogen atom, halogen, alkyl, or alkoxy; and y is an integer from 1 to 3, wherein the fused aromatic ring is a liner ring or branched ring with y greater than or equal to 2. A photoresist composition is also provided which includes the photosensitive polymer and a photoacid generator(PAG).
Inventors:
Cui Ai Shun
Ginger law
Ginger law
Application Number:
JP2000299878A
Publication Date:
March 05, 2008
Filing Date:
September 29, 2000
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08F220/18; G03F7/004; C08F212/14; C08F222/06; C08F232/08; C08K5/00; C08L33/04; G03F7/033; G03F7/039; H01L21/027
Domestic Patent References:
| JP10186647A | ||||
| JP8286384A | ||||
| JP4255857A | ||||
| JP10330432A | ||||
| JP57177139A | ||||
| JP2262152A | ||||
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Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani