Title:
EUV光露光用フラーレン誘導体含有レジスト組成物並びにこれを用いたレジストパターン形成方法
Document Type and Number:
Japanese Patent JP5457785
Kind Code:
B2
Inventors:
Hiroaki Oizumi
Katsutoshi Tanaka
Kotoku Kawakami
Katsutoshi Tanaka
Kotoku Kawakami
Application Number:
JP2009238842A
Publication Date:
April 02, 2014
Filing Date:
October 16, 2009
Export Citation:
Assignee:
Mitsubishi Corporation
International Classes:
G03F7/004; C07C25/02; C07C43/205; C07C309/06; C07C381/12; C09K3/00; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
| JP2008033102A | ||||
| JP2006227398A |
Attorney, Agent or Firm:
Yu Sanada