液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Title:

液浸露光用レジスト組成物及びそれを用いたパターン形成方法

Document Type and Number:

Japanese Patent JP5222804

Kind Code:

B2

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Inventors:

Inabe Haruki
Shinichi Kanna
Takahashi table
Hiromi Kanda

Application Number:

JP2009159317A

Publication Date:

June 26, 2013

Filing Date:

July 03, 2009

Export Citation:

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Assignee:

FUJIFILM Corporation

International Classes:

G03F7/004; C08F216/14; C08F220/06; C08F220/28; C08F222/06; C08F232/04; C08F234/02; G03F7/039; G03F7/38; H01L21/027

Domestic Patent References:

JP2003255539A
JP2003122018A
JP2003337419A
JP2003337416A
JP2003215806A
JP2003255542A
JP2003147023A

Attorney, Agent or Firm:

Takeshi Takamatsu
Toshiyuki Ozawa
Hasegawa Hiromichi

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