Title:
感活性光線性又は感放射線性組成物、並びに、これを用いた、レジスト膜、パターン形成方法、レジスト塗布マスクブランクス、フォトマスクの製造方法、及び電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP6438645
Kind Code:
B2
Abstract:
There is provided an active light sensitive or radiation sensitive composition which contains (A) a compound that generates an acid by irradiation with active light or radiation, (P) a compound of which the solubility in alkali developers is increased due to the action of an acid, and (N) at least one specific compound, and which can satisfy high resolving power, an excellent pattern shape, and low line width roughness (LWR) at the same time to a high level in formation of a very fine pattern (for example, a line width of 50 nm or less), and a resist film, a pattern forming method, a resist-coated mask blank, a method for producing a photomask, a photomask, a method for manufacturing an electronic device, and an electronic device, each of which uses this active light sensitive or radiation sensitive composition.
Inventors:
Shuhei Yamaguchi
Application Number:
JP2013200599A
Publication Date:
December 19, 2018
Filing Date:
September 26, 2013
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C08F12/22; C08F20/26; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP2012173438A | ||||
JP2012242556A | ||||
JP2013174660A | ||||
JP200119799A | ||||
JP10104839A | ||||
JP7261392A | ||||
JP2002169294A | ||||
JP2010271707A | ||||
JP201364988A | ||||
JP2012208453A | ||||
JP2012215826A | ||||
JP201350673A | ||||
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JP2012255845A | ||||
JP2006208781A | ||||
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JP2012226327A | ||||
JP2014153463A |
Foreign References:
WO2012169620A1 |
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office
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