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Title:
感活性光線性又は感放射線性組成物、並びに、これを用いた、レジスト膜、パターン形成方法、レジスト塗布マスクブランクス、フォトマスクの製造方法、及び電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP6438645
Kind Code:
B2
Abstract:
There is provided an active light sensitive or radiation sensitive composition which contains (A) a compound that generates an acid by irradiation with active light or radiation, (P) a compound of which the solubility in alkali developers is increased due to the action of an acid, and (N) at least one specific compound, and which can satisfy high resolving power, an excellent pattern shape, and low line width roughness (LWR) at the same time to a high level in formation of a very fine pattern (for example, a line width of 50 nm or less), and a resist film, a pattern forming method, a resist-coated mask blank, a method for producing a photomask, a photomask, a method for manufacturing an electronic device, and an electronic device, each of which uses this active light sensitive or radiation sensitive composition.

Inventors:
Shuhei Yamaguchi
Application Number:
JP2013200599A
Publication Date:
December 19, 2018
Filing Date:
September 26, 2013
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03F7/004; C08F12/22; C08F20/26; G03F7/038; G03F7/039; H01L21/027
Domestic Patent References:
JP2012173438A
JP2012242556A
JP2013174660A
JP200119799A
JP10104839A
JP7261392A
JP2002169294A
JP2010271707A
JP201364988A
JP2012208453A
JP2012215826A
JP201350673A
JP10221852A
JP2012255845A
JP2006208781A
JP2006330098A
JP2012236816A
JP2012226327A
JP2014153463A
Foreign References:
WO2012169620A1
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office