Title:
ピロールノボラック樹脂を含むレジスト下層膜形成組成物
Document Type and Number:
Japanese Patent JP6436313
Kind Code:
B2
Abstract:
An excellent resist underlayer film having a selectivity of dry etching rate close to that of a resist, selectivity of dry etching rate lower than that of a resist, or selectivity of dry etching rate lower than that of semiconductor substrate. Resist underlayer film-forming composition including a polymer containing unit structure of Formula (1): (where R3 is hydrogen atom, or C6-40 aryl group or heterocyclic group optionally substituted with halogen group, nitro group, amino group, carbonyl group, C6-40 aryl group, or hydroxy group; R4 is a hydrogen atom, or C1-10 alkyl group, C6-40 aryl group, or heterocyclic group optionally substituted with halogen group, nitro group, amino group, or hydroxy group; R3 and R4 optionally form ring together with carbon atoms bonded thereto; and n is an integer of 0 to 2).
Inventors:
Tetsuya Shinshiro
Someya Yasunobu
Ryo Ezawa
Nishimaki Hirokazu
Takafumi Endo
Keisuke Hashimoto
Someya Yasunobu
Ryo Ezawa
Nishimaki Hirokazu
Takafumi Endo
Keisuke Hashimoto
Application Number:
JP2015524037A
Publication Date:
December 12, 2018
Filing Date:
June 23, 2014
Export Citation:
Assignee:
Nissan Chemical Co., Ltd.
International Classes:
G03F7/11; C08G12/26; G03F7/26; H01L21/027
Domestic Patent References:
| JP2001354674A |
Foreign References:
| EP1505095A1 | ||||
| WO2013047516A1 | ||||
| WO2010147155A1 |
Other References:
LIN Jinxian, WANG Pan and ZHENG Yuying,PREPARATION AND CHARACTERIZATION OF A POLY(PYRROLYL METHANE)/MULTIWALLED CARBON NANOTUBES COMPOSITES,NANO: Breif Reports and Reviews,SG,World Scientific Publishing Co. Pte. Ltd.,2013年12月20日,Vol.8, No.6,pp.1350063-1 - 1350063-7
Attorney, Agent or Firm:
Hanabusa Patent and Trademark Office