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Patent Searching and Data


Title:
A resist material and a pattern formation method using this
Document Type and Number:
Japanese Patent JP6119544
Kind Code:
B2
Inventors:
畠山 潤
片山 和弘
橘 誠一郎
Application Number:
JP2013209487A
Publication Date:
April 26, 2017
Filing Date:
October 04, 2013
Export Citation:
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Assignee:
信越化学工業株式会社
International Classes:
G03F7/004; C07F7/00; C07F7/28; C08G79/00; G03F7/32
Domestic Patent References:
JP2000247640A
JP2011253185A
JP2001092126A
JP2014178602A
JP2014199429A
JP2010085893A
JP2009126940A
Attorney, Agent or Firm:
小島 隆司
重松 沙織
小林 克成
石川 武史
正木 克彦