A resist pattern formation method and the constituent for protective film formation

Title:

A resist pattern formation method and the constituent for protective film formation

Document Type and Number:

Japanese Patent JP6194670

Kind Code:

B2

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Inventors:

Kota Nishino
Mineki Kawakami
Shiratani Sodai
Kenji Hoshiko
Inukai Koji

Application Number:

JP2013154047A

Publication Date:

September 13, 2017

Filing Date:

July 24, 2013

Export Citation:

Assignee:

JSR CORPORATION

International Classes:

G03F7/11; H01L21/027

Domestic Patent References:

Attorney, Agent or Firm:

Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Yoshiaki Negi
Kazuya Kawabata
Takashi Shiotani

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