Title:
レジスト剥離方法およびレジスト剥離装置
Document Type and Number:
Japanese Patent JP4439956
Kind Code:
B2
Abstract:
After the resist stripping liquid is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced from the first rotational speed to a second rotational speed with the supply of the resist stripping liquid to the surface of the substrate continued, thereby forming a liquid film by a mount of the resist stripping liquid on the surface of the substrate and then, maintaining a state where the liquid film is formed.
Inventors:
Atsushi Okuyama
Kazumi Asada
Io Okamoto
Yuji Sugawara
Kazumi Asada
Io Okamoto
Yuji Sugawara
Application Number:
JP2004074814A
Publication Date:
March 24, 2010
Filing Date:
March 16, 2004
Export Citation:
Assignee:
ソニー株式会社
大日本スクリーン製造株式会社
大日本スクリーン製造株式会社
International Classes:
G03F7/42; H01L21/027; B08B3/08; B08B7/00; G03C5/00; H01L21/00; H01L21/304
Domestic Patent References:
| JP9213616A | ||||
| JP6291098A | ||||
| JP7263302A | ||||
| JP1179321A | ||||
| JP2002028588A |
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Mio Kawasaki