Title:
処理チャンバ内での層堆積中に基板キャリアとマスクキャリアを支持するための保持装置、基板を支持する基板キャリアとマスクキャリアを位置合わせするための方法
Document Type and Number:
Japanese Patent JP6723246
Kind Code:
B2
Abstract:
A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.
Inventors:
Vercesi, Tommaso
Hearth, dieter
Bungert, Stephan
High Mill, Oliver
Githron, Daniele
Hearth, dieter
Bungert, Stephan
High Mill, Oliver
Githron, Daniele
Application Number:
JP2017536784A
Publication Date:
July 15, 2020
Filing Date:
January 12, 2015
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C14/04; H01L21/68; H01L21/683; H01L51/50; H05B33/10
Domestic Patent References:
| JP2013093279A | ||||
| JP2010270397A | ||||
| JP2013204097A |
Foreign References:
| WO2012043150A1 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation