Title:
位置計測方法および該位置計測法を用いた半導体露光装置
Document Type and Number:
Japanese Patent JP4046884
Kind Code:
B2
Abstract:
A position measuring method for measuring a position of a mark formed on an object, includes detecting a mark waveform obtainable from the mark, acquiring a difference between the detected mark waveform and a reference waveform, correcting at least one of the mark waveform and the reference waveform on the basis of the acquired difference, and determining the position of the mark on the basis of (i) the corrected mark waveform and the reference waveform, (ii) the mark waveform and the corrected reference waveform, or (iii) the corrected waveform and the corrected reference waveform.
More Like This:
Inventors:
Shinichiro Koga
Application Number:
JP8405299A
Publication Date:
February 13, 2008
Filing Date:
March 26, 1999
Export Citation:
Assignee:
Canon Inc
International Classes:
G01B11/00; H01L21/027; G03F9/00
Domestic Patent References:
| JP11054418A | ||||
| JP6275496A | ||||
| JP10038514A | ||||
| JP10289855A |
Attorney, Agent or Firm:
Yukio Takanashi