Title:
シリルアミン化合物、それを含むシリコン含有薄膜蒸着用組成物、およびそれを用いたシリコン含有薄膜の製造方法
Document Type and Number:
Japanese Patent JP6900503
Kind Code:
B2
Abstract:
Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.
Inventors:
Kim Seung Gi
Park Jung Ju
Park Jung Jin
Jean Sejin
Yang Byung-il
Island
Isamu Dong
Issan Iku
Kim Myung Eun
Park Jung Ju
Park Jung Jin
Jean Sejin
Yang Byung-il
Island
Isamu Dong
Issan Iku
Kim Myung Eun
Application Number:
JP2019553084A
Publication Date:
July 07, 2021
Filing Date:
March 28, 2018
Export Citation:
Assignee:
DNF Co. Ltd.
International Classes:
C07F7/02; C23C16/42; C23C16/455; C23C16/50; H01L21/316; H01L21/318; H01L29/786; H01L51/05; H01L51/40
Domestic Patent References:
| JP2014237644A | ||||
| JP2016526051A |
Foreign References:
| EP2048699A1 |
Attorney, Agent or Firm:
Hayashi Ichiyoshi
Tetsuo Shiba
Takuya Saito
Iwaike Mitsuru
Kazuhiro Kosuga
Tetsuo Shiba
Takuya Saito
Iwaike Mitsuru
Kazuhiro Kosuga
Previous Patent: 無線通信システムにおけるサイドリンク同期信号送信方法及び前記方法を...
Next Patent: 電気機械のローターパラメータを測定するためのローター測定ユニットを...
Next Patent: 電気機械のローターパラメータを測定するためのローター測定ユニットを...