Title:
固体ポリマー構造体形成プロセス及び固体ポリマー構造体
Document Type and Number:
Japanese Patent JP4351446
Kind Code:
B2
Abstract:
A thermally-stable cationic photoinitiator capable of flash vaporization under vacuum and temperature conditions of an available flash-evaporation chamber is selected. The photoinitiator is mixed with a cation-polymerizable monomer and/or oligomer of interest and the mixture is flash evaporated and condensed in conventional manner as a film on a cold substrate. The resulting vacuum-deposited, homogeneous layer is cured with a high-energy radiation source that causes the cationic photoinitiator to liberate acidic species that catalyze the crosslinking of the monomer/oligomer compounds in its deposited film form. As a result of the homogeneous, pinhole-free nature of the vacuum deposition process, the thin-film polymer product does not suffer from the disadvantages attendant to prior-art atmospheric processes for cationically-cured polymers. In addition, because of the versatility afforded by vacuum deposition, hybrid films of such polymers with inorganic materials are also easily manufactured in-line during the same process.
Inventors:
Michael, Michelle g.
Angeliz, Yalitz
Angeliz, Yalitz
Application Number:
JP2002564053A
Publication Date:
October 28, 2009
Filing Date:
February 07, 2002
Export Citation:
Assignee:
Sigma Technologies International, Inc.
International Classes:
B05D3/10; B05D3/06; B05D7/04; B05D7/24; C08J7/16; C23C14/12; B05D3/14; C08L101/00
Domestic Patent References:
| JP2002537113A | ||||
| JP6157621A | ||||
| JP2000086756A | ||||
| JP2001524386A |
Foreign References:
| WO2000050179A1 |
Attorney, Agent or Firm:
Shinichiro Nanjo