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Title:
SOLUTION FILM FORMATION METHOD AND EQUIPMENT
Document Type and Number:
Japanese Patent JP2016165811
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a solution film formation method and equipment for producing a film with a thickness of 40 μm or lower in which non-directive thickness variation is suppressed.SOLUTION: A flow casting device 11 in solution film formation equipment 10 is provided with: a suction drying unit 41; and an aeration drying unit 42. The suction drying unit 41 comprises: an infrared heater 50; a first suction part 51; a second suction part 52; and a third suction part 53. The infrared heater 50 dries a flow casting film 29 by heating the same from immediately after the formation of the flow casting film to a solvent content of 300%. The first suction part 51, the second suction part 52 and the third suction part 53 suck the gas at the outside of the side edge 23e of a belt 23. By this suction, the wind velocity on the flow casting film 29 is suppressed to 0.5 m/s or lower, and also, the concentration of a solvent gas is suppressed to 10% or lower in the atmosphere on the flow casting film 29.The aeration drying unit 42 progresses the drying of the flow casting film 29 having passed through suction drying treatment by the suction drying unit 41.SELECTED DRAWING: Figure 3

Inventors:
KANEMURA KAZUHIDE
Application Number:
JP2015045837A
Publication Date:
September 15, 2016
Filing Date:
March 09, 2015
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
B29C41/52; B29C41/28; C08J5/18
Domestic Patent References:
JPH1158425A1999-03-02
JP2012030481A2012-02-16
JP2008260919A2008-10-30
JP2012143989A2012-08-02
JP2008188941A2008-08-21
JP2007320182A2007-12-13
JP2012066483A2012-04-05
Attorney, Agent or Firm:
Kobayashi International Patent Office